Glass wafers made of Borofloat33® glass are often used in Semiconductor and MEMS industry in a wide variety of applications. These wafers can be used for the encapsulation of MEMS devices for example for sensors using Wafer-Level-Packaging (WLP) technology or as blank glass substrates for semiconductor processing and optics.

Wafer Universe stock products from Borofloat33® glass have a coefficient of thermal expansion (cte) that is adapted to silicon, which makes them the perfect substrate to use in anodic bonding. The glass features good transmission over a wide spectrum as well as high chemical resistance and mechanical strength. Furthermore, these wafers can be used in high temperature processing.

100 mm wafers

  • material: Borofloat33® glass
  • cte: 3.25 ppm/K (adapted to Si)
  • diameter: 100 mm
  • diameter tolerance: ± 0.3 mm
  • thickness tolerance: ± 10 μm
  • polishing: double side polished
  • surface roughness (Ra): < 1 nm
  • ttv: < 10 μm
  • bow: < 30 μm
  • flat: according to SEMI (32.5 mm)
  • surface: scratch-dig 60-40 according MIL-PRF-13830
  • edge exclusion: 6 mm
  • packing: clean room packed under ISO 6 conditions according to ISO 14644
  • packing units: 10 pcs, 25 pcs
  • material data sheet
thickness (μm) article number shop
200 DSP-100×0200-B33-00
300 DSP-100×0300-B33-00
400 DSP-100×0400-B33-00
500 DSP-100×0500-B33-00
600 DSP-100×0600-B33-00
700 DSP-100×0700-B33-00
1000 DSP-100×1000-B33-00

150 mm wafers

  • material: Borofloat33® glass
  • cte: 3.25 ppm/K (adapted to Si)
  • diameter: 150 mm
  • diameter tolerance: ± 0.3 mm
  • thickness tolerance: ± 10 μm
  • polishing: double side polished
  • surface roughness (Ra): < 1 nm
  • ttv: < 10 μm
  • bow: < 60 μm
  • flat: according to SEMI (57.5 mm)
  • surface: scratch-dig 60-40 according MIL-PRF-13830
  • edge exclusion: 6 mm
  • packing: clean room packed under ISO 6 conditions according to ISO 14644
  • packing units: 10 pcs, 25 pcs
  • material data sheet
thickness (μm) article number shop
200 DSP-150×0200-B33-00
300 DSP-150×0300-B33-00
400 DSP-150×0400-B33-00
500 DSP-150×0500-B33-00
600 DSP-150×0600-B33-00
700 DSP-150×0700-B33-00
1000 DSP-150×1000-B33-00

200 mm wafers

  • material: Borofloat33® glass
  • cte: 3.25 ppm/K (adapted to Si)
  • diameter: 200 mm
  • diameter tolerance: ± 0.3 mm
  • thickness tolerance: ± 10 μm
  • polishing: double side polished
  • surface roughness (Ra): < 1 nm
  • ttv: < 10 μm
  • bow: < 80 μm
  • notch: according to SEMI
  • surface: scratch-dig 60-40 according MIL-PRF-13830
  • edge exclusion: 6 mm
  • packing: clean room packed under ISO 6 conditions according to ISO 14644
  • packing units: 10 pcs, 25 pcs
  • material data sheet
thickness (μm) article number Shop
200 DSP-200×0200-B33-00
300 DSP-200×0300-B33-00
400 DSP-200×0400-B33-00
500 DSP-200×0500-B33-00
600 DSP-200×0600-B33-00
700 DSP-200×0700-B33-00
1000 DSP-200×1000-B33-00

300 mm wafers

  • material: Borofloat33® glass
  • cte: 3.25 ppm/K (adapted to Si)
  • diameter: 300 mm
  • diameter tolerance: ± 0.3 mm
  • thickness tolerance: ± 10 μm
  • polishing: double side polished
  • surface roughness (Ra): < 1 nm
  • ttv: < 10 μm
  • bow: < 100 μm
  • notch: according to SEMI
  • surface: scratch-dig 60-40 according MIL-PRF-13830
  • edge exclusion: 6 mm
  • packing: clean room packed under ISO 6 conditions according to ISO 14644
  • packing units: 10 pcs, 25 pcs
  • material data sheet
thickness (μm) article number shop
400 DSP-300×0400-B33-00
500 DSP-300×0500-B33-00
700 DSP-300×0700-B33-00
1000 DSP-300×1000-B33-00

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